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New low-stress PECVD Poly-SiGe layers for MEMS

dc.contributor.authorRusu, Cristina
dc.contributor.authorSedky, S.
dc.contributor.authorParmentier, Brigitte
dc.contributor.authorVerbist, Agnes
dc.contributor.authorRichard, Olivier
dc.contributor.authorBrijs, Bert
dc.contributor.authorGeenen, Luc
dc.contributor.authorWitvrouw, Ann
dc.contributor.authorLärmer, F.
dc.contributor.authorFischer, F.
dc.contributor.authorKronmüller, S.
dc.contributor.authorLeca, V.
dc.contributor.authorOtter, B.
dc.date.accessioned2021-10-15T06:28:47Z
dc.date.available2021-10-15T06:28:47Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8096
dc.sourceIIOimport
dc.titleNew low-stress PECVD Poly-SiGe layers for MEMS
dc.typeJournal article
dc.contributor.imecauthorParmentier, Brigitte
dc.contributor.imecauthorRichard, Olivier
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage816
dc.source.endpage825
dc.source.journalJournal of Microelectromechanical Systems
dc.source.issue6
dc.source.volume12
imec.availabilityPublished - imec


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