Growth mechanism and properties of atomic atomic layer deposited ultra-thin TiN films
dc.contributor.author | Satta, Alessandra | |
dc.date.accessioned | 2021-10-15T06:29:57Z | |
dc.date.available | 2021-10-15T06:29:57Z | |
dc.date.issued | 2003-05 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8101 | |
dc.source | IIOimport | |
dc.title | Growth mechanism and properties of atomic atomic layer deposited ultra-thin TiN films | |
dc.type | PHD thesis | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.contributor.thesisadvisor | Vantomme, Andr� | |
dc.contributor.thesisadvisor | Maex, Karen | |
imec.availability | Published - open access |