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Simulations of diffusion barrier deposition on porous low-k films

dc.contributor.authorYanovitskaya, Z.S.
dc.contributor.authorZverev, A.V.
dc.contributor.authorShamiryan, Denis
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T07:55:54Z
dc.date.available2021-10-15T07:55:54Z
dc.date.issued2003-11
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8428
dc.sourceIIOimport
dc.titleSimulations of diffusion barrier deposition on porous low-k films
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage363
dc.source.endpage367
dc.source.journalMicroelectronic Engineering
dc.source.issue2_4
dc.source.volume70
imec.availabilityPublished - imec


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