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MOCVD of bismuth oxides: transport properties and deposition mechanisme of the Bi(C6H5)3 precursor

dc.contributor.authorBedoya, C.
dc.contributor.authorCondorelli, G.G.
dc.contributor.authorAnastasi, G.
dc.contributor.authorBaeri, A.
dc.contributor.authorScerra, F.
dc.contributor.authorFragala, I.L.
dc.contributor.authorLisoni, Judit
dc.contributor.authorWouters, Dirk
dc.date.accessioned2021-10-15T12:41:53Z
dc.date.available2021-10-15T12:41:53Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8554
dc.sourceIIOimport
dc.titleMOCVD of bismuth oxides: transport properties and deposition mechanisme of the Bi(C6H5)3 precursor
dc.typeJournal article
dc.source.peerreviewno
dc.source.beginpage3176
dc.source.endpage3183
dc.source.journalChemistry of Materials
dc.source.issue16
dc.source.volume16
imec.availabilityPublished - imec


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