Show simple item record

Nanometer scale characterisation of CoSi2 and NiSi induced strain in silicon by convergent beam electron diffraction

dc.contributor.authorBenedetti, Alessandro
dc.contributor.authorBender, Hugo
dc.contributor.authorTorregiani, Cristina
dc.contributor.authorVan Dal, Mark
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T12:42:21Z
dc.date.available2021-10-15T12:42:21Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8562
dc.sourceIIOimport
dc.titleNanometer scale characterisation of CoSi2 and NiSi induced strain in silicon by convergent beam electron diffraction
dc.typeJournal article
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage61
dc.source.endpage66
dc.source.journalMaterials Science and Engineering B
dc.source.volume114-115
imec.availabilityPublished - imec
imec.internalnotesPaper from: E-MRS Spring Meeting Symposium B: Materials Science Issues in Advanced CMOS Source-Drain Engineering; May 2004; Strasbourg


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record