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Sputter rate variations in silicon under high-k dielectric films

dc.contributor.authorBennett, J.
dc.contributor.authorBeebe, M.
dc.contributor.authorSparks, C.
dc.contributor.authorGondran, C.
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-15T12:42:32Z
dc.date.available2021-10-15T12:42:32Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8565
dc.sourceIIOimport
dc.titleSputter rate variations in silicon under high-k dielectric films
dc.typeJournal article
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage565
dc.source.endpage568
dc.source.journalApplied Surface Science
dc.source.volume231-232
imec.availabilityPublished - imec


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