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Reaction of Ni and Si0.8Ge0.2: phase formation and thermal stability

dc.contributor.authorChamirian, Oxana
dc.contributor.authorLauwers, Anne
dc.contributor.authorKittl, Jorge
dc.contributor.authorVan Dal, Mark
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorLindsay, Richard
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T12:50:29Z
dc.date.available2021-10-15T12:50:29Z
dc.date.issued2004-11
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8666
dc.sourceIIOimport
dc.titleReaction of Ni and Si0.8Ge0.2: phase formation and thermal stability
dc.typeJournal article
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage297
dc.source.endpage302
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume76
imec.availabilityPublished - imec
imec.internalnotesEuropean Workshop on Materials for Advanced Metallisation; March 2004


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