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Plasma hydrogenation of strain-relaxed SiGe/Si heterostructure for layer transfer

dc.contributor.authorChen, Peng
dc.contributor.authorChu, Paul K.
dc.contributor.authorHöchbauer, T.
dc.contributor.authorNastasi, M.
dc.contributor.authorBuca, D.
dc.contributor.authorMantl, S.
dc.contributor.authorTheodore, N. David
dc.contributor.authorAlford, T.L.
dc.contributor.authorMayer, J. W.
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorCai, M.
dc.contributor.authorLau, S.
dc.date.accessioned2021-10-15T12:51:12Z
dc.date.available2021-10-15T12:51:12Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8673
dc.sourceIIOimport
dc.titlePlasma hydrogenation of strain-relaxed SiGe/Si heterostructure for layer transfer
dc.typeJournal article
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.beginpage4944
dc.source.endpage4946
dc.source.journalApplied Physics Letters
dc.source.issue21
dc.source.volume85
imec.availabilityPublished - imec


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