dc.contributor.author | Eitoku, Atsuro | |
dc.contributor.author | Snow, Jim | |
dc.contributor.author | Vos, Rita | |
dc.contributor.author | Kenis, Karine | |
dc.contributor.author | Mertens, Paul | |
dc.date.accessioned | 2021-10-15T13:19:42Z | |
dc.date.available | 2021-10-15T13:19:42Z | |
dc.date.issued | 2004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8876 | |
dc.source | IIOimport | |
dc.title | Influences of oxide loss on contamination removal | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Vos, Rita | |
dc.contributor.imecauthor | Kenis, Karine | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.source.peerreview | no | |
dc.source.conference | 7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS | |
dc.source.conferencedate | 20/09/2004 | |
dc.source.conferencelocation | Brussel Belgium | |
imec.availability | Published - imec | |