dc.contributor.author | Eyben, Pierre | |
dc.contributor.author | Alvarez, David | |
dc.contributor.author | Jurczak, Gosia | |
dc.contributor.author | Rooyackers, Rita | |
dc.contributor.author | De Keersgieter, An | |
dc.contributor.author | Augendre, Emmanuel | |
dc.contributor.author | Vandervorst, Wilfried | |
dc.date.accessioned | 2021-10-15T13:23:07Z | |
dc.date.available | 2021-10-15T13:23:07Z | |
dc.date.issued | 2004-01 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8895 | |
dc.source | IIOimport | |
dc.title | Analysis of the two-dimensional-dopant profile in a 90 nm complementary metal-oxide-semiconductor technology using scanning spreading resistance microscopy | |
dc.type | Journal article | |
dc.contributor.imecauthor | Eyben, Pierre | |
dc.contributor.imecauthor | Jurczak, Gosia | |
dc.contributor.imecauthor | De Keersgieter, An | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.contributor.orcidimec | De Keersgieter, An::0000-0002-5527-8582 | |
dc.source.peerreview | no | |
dc.source.beginpage | 364 | |
dc.source.endpage | 368 | |
dc.source.journal | Journal of Vacuum Science & Technology B | |
dc.source.issue | 1 | |
dc.source.volume | 22 | |
imec.availability | Published - imec | |