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Drying of hydrophobic surfaces - one of the keys for future technologies

dc.contributor.authorKraus, Harald
dc.contributor.authorSnow, Jim
dc.contributor.authorMertens, Paul
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorKenis, Karine
dc.contributor.authorKovacs, F.
dc.contributor.authorFichtl, S.
dc.date.accessioned2021-10-15T14:15:01Z
dc.date.available2021-10-15T14:15:01Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9147
dc.sourceIIOimport
dc.titleDrying of hydrophobic surfaces - one of the keys for future technologies
dc.typeMeeting abstract
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorKenis, Karine
dc.source.peerreviewno
dc.source.conferenceAdvanced Semiconductor Manufacturing Conference - ASMC
dc.source.conferencedate4/05/2004
dc.source.conferencelocationBoston, MA, USA
imec.availabilityPublished - imec


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