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Low temperature spike anneal for Ni-Silicide formation

dc.contributor.authorLauwers, Anne
dc.contributor.authorKittl, Jorge
dc.contributor.authorVan Dal, Mark
dc.contributor.authorChamirian, Oxana
dc.contributor.authorLindsay, Richard
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorDemeurisse, Caroline
dc.contributor.authorVrancken, Christa
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T14:23:18Z
dc.date.available2021-10-15T14:23:18Z
dc.date.issued2004-11
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9183
dc.sourceIIOimport
dc.titleLow temperature spike anneal for Ni-Silicide formation
dc.typeJournal article
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorDemeurisse, Caroline
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage303
dc.source.endpage310
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume76
imec.availabilityPublished - open access
imec.internalnotesEuropean Workshop on Materials for Advanced Metallisation; March 2004


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