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Use of positive and negative chemically amplified resists in electron-beam direct-write lithography

dc.contributor.authorTritchkov, Alexander
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T13:18:04Z
dc.date.available2021-09-29T13:18:04Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/919
dc.sourceIIOimport
dc.titleUse of positive and negative chemically amplified resists in electron-beam direct-write lithography
dc.typeJournal article
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage2986
dc.source.endpage2993
dc.source.journalJ. Vac. Sci. Technol. B
dc.source.volume13
imec.availabilityPublished - imec


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