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Growth and characterization of atomic layer deposited WC0.7N0.3 on polymer films

dc.contributor.authorMartin Hoyas, Ana
dc.contributor.authorSchuhmacher, Jorg
dc.contributor.authorShamiryan, Denis
dc.contributor.authorWaeterloos, Joost
dc.contributor.authorBesling, W.
dc.contributor.authorCelis, Jean-Pierre
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T14:45:40Z
dc.date.available2021-10-15T14:45:40Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9273
dc.sourceIIOimport
dc.titleGrowth and characterization of atomic layer deposited WC0.7N0.3 on polymer films
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage381
dc.source.endpage388
dc.source.journalJournal of Applied Physics
dc.source.issue1
dc.source.volume95
imec.availabilityPublished - imec


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