| dc.contributor.author | Van den hove, Luc | |
| dc.contributor.author | Ronse, Kurt | |
| dc.date.accessioned | 2021-09-29T13:18:41Z | |
| dc.date.available | 2021-09-29T13:18:41Z | |
| dc.date.issued | 1995 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/930 | |
| dc.source | IIOimport | |
| dc.title | Challenges for 0.35-0.25 μm optical lithography | |
| dc.type | Journal article | |
| dc.contributor.imecauthor | Van den hove, Luc | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.embargo | 9999-12-31 | |
| dc.source.peerreview | no | |
| dc.source.beginpage | 357 | |
| dc.source.endpage | 365 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.issue | 1_4 | |
| dc.source.volume | 27 | |
| imec.availability | Published - open access | |
| imec.internalnotes | Proceedings of the International Conference on Micro- and Nanofabrication. September 26-29, 1994. Davos, Switzerland. | |
