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Physical properties of polycrystalline aluminium nitride films deposited by magnetron sputtering

dc.contributor.authorMortet, V.
dc.contributor.authorNesladek, Milos
dc.contributor.authorHaenen, K.
dc.contributor.authorMorel, A.
dc.contributor.authorD'Olieslaeger, Marc
dc.contributor.authorVanecek, M.
dc.date.accessioned2021-10-15T14:59:32Z
dc.date.available2021-10-15T14:59:32Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9325
dc.sourceIIOimport
dc.titlePhysical properties of polycrystalline aluminium nitride films deposited by magnetron sputtering
dc.typeJournal article
dc.contributor.imecauthorNesladek, Milos
dc.contributor.imecauthorD'Olieslaeger, Marc
dc.source.peerreviewno
dc.source.beginpage1120
dc.source.endpage1124
dc.source.journalDiamond and Related Materials
dc.source.issue4_8
dc.source.volume13
imec.availabilityPublished - imec


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