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DUV lithography for 0.35 μm CMOS processing

dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorGoethals, Mieke
dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T13:19:08Z
dc.date.available2021-09-29T13:19:08Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/937
dc.sourceIIOimport
dc.titleDUV lithography for 0.35 μm CMOS processing
dc.typeJournal article
dc.contributor.imecauthorVan Driessche, Veerle
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage243
dc.source.endpage246
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume27
imec.availabilityPublished - open access
imec.internalnotesProceedings of the International Conference on Micro- and Nanofabrication. September 26-29, 1994. Davos, Switzerland.


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