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Thin film boron doped polycrystalline silicon70%germanium30% for thermopiles

dc.contributor.authorVan Gerwen, Peter
dc.contributor.authorSlater, Tim
dc.contributor.authorChévrier, Jean-Baptiste
dc.contributor.authorBaert, Kris
dc.contributor.authorMertens, Robert
dc.date.accessioned2021-09-29T13:19:25Z
dc.date.available2021-09-29T13:19:25Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/941
dc.sourceIIOimport
dc.titleThin film boron doped polycrystalline silicon70%germanium30% for thermopiles
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Robert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage210
dc.source.endpage213
dc.source.conferenceProceedings of the International Solid-State Sensors and Actuators Conference - TRANSDUCERS '95
dc.source.conferencedate25/06/1995
dc.source.conferencelocationStockholm Sweden
imec.availabilityPublished - open access


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