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Structural, optical and electrical properties of nanodiamond films deposited by HFCVD on borosilicate glass, fused silica and silicon at low temperature

dc.contributor.authorRemes, Z.
dc.contributor.authorAvigal, Y.
dc.contributor.authorKalish, R.
dc.contributor.authorUzan-Saguy, C.
dc.contributor.authorChack, A.
dc.contributor.authorNesladek, Milos
dc.date.accessioned2021-10-15T15:47:52Z
dc.date.available2021-10-15T15:47:52Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9503
dc.sourceIIOimport
dc.titleStructural, optical and electrical properties of nanodiamond films deposited by HFCVD on borosilicate glass, fused silica and silicon at low temperature
dc.typeJournal article
dc.contributor.imecauthorNesladek, Milos
dc.source.peerreviewno
dc.source.beginpage2499
dc.source.endpage2502
dc.source.journalPhysica Status Solidi A
dc.source.issue11
dc.source.volume201
imec.availabilityPublished - imec


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