dc.contributor.author | Rittersma, Chris | |
dc.contributor.author | Loo, Josine | |
dc.contributor.author | Ponomarev, Youri | |
dc.contributor.author | Verheijen, M.A. | |
dc.contributor.author | Kaiser, M. | |
dc.contributor.author | Roozeboom, F. | |
dc.contributor.author | Van Elshocht, Sven | |
dc.contributor.author | Caymax, Matty | |
dc.date.accessioned | 2021-10-15T15:50:44Z | |
dc.date.available | 2021-10-15T15:50:44Z | |
dc.date.issued | 2004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9513 | |
dc.source | IIOimport | |
dc.title | Characterization of thermal and electrical stability of MOCVD HfO2-HfSiO4 dielectric layers with polysilicon electrodes for advanced CMOS technologies | |
dc.type | Journal article | |
dc.contributor.imecauthor | Van Elshocht, Sven | |
dc.contributor.imecauthor | Caymax, Matty | |
dc.contributor.orcidimec | Van Elshocht, Sven::0000-0002-6512-1909 | |
dc.source.peerreview | no | |
dc.source.beginpage | G870 | |
dc.source.endpage | G877 | |
dc.source.journal | Journal of the Electrochemical Society | |
dc.source.issue | 12 | |
dc.source.volume | 151 | |
imec.availability | Published - imec | |