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Status and critical challenges for 157nm lithography

dc.contributor.authorRonse, Kurt
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorGoethals, Mieke
dc.contributor.authorHermans, Jan
dc.contributor.authorJonckheere, Rik
dc.contributor.authorLight, Scott
dc.contributor.authorOkoroanyanwu, Uzo
dc.contributor.authorWatso, Robert
dc.contributor.authorMcAfferty, D.
dc.contributor.authorIvaldi, J.
dc.contributor.authorOneil, T.
dc.contributor.authorSewell, H.
dc.date.accessioned2021-10-15T15:54:13Z
dc.date.available2021-10-15T15:54:13Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9526
dc.sourceIIOimport
dc.titleStatus and critical challenges for 157nm lithography
dc.typeJournal article
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage5
dc.source.endpage10
dc.source.journalMicroelectronic Engineering
dc.source.volume73-74
imec.availabilityPublished - imec
imec.internalnotesPaper from Micro and Nano Engineering 2003


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