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Initial growth mechanism of atomic layer deposited TiN

dc.contributor.authorSatta, Alessandra
dc.contributor.authorVantomme, Andre
dc.contributor.authorSchuhmacher, Jorg
dc.contributor.authorWhelan, Caroline
dc.contributor.authorSutcliffe, Victor
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T16:02:05Z
dc.date.available2021-10-15T16:02:05Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9553
dc.sourceIIOimport
dc.titleInitial growth mechanism of atomic layer deposited TiN
dc.typeJournal article
dc.contributor.imecauthorVantomme, Andre
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage4571
dc.source.endpage4573
dc.source.journalApplied Physics Letters
dc.source.issue22
dc.source.volume84
imec.availabilityPublished - imec


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