Show simple item record

Removing metal gate process residues

dc.contributor.authorSnow, Jim
dc.contributor.authorFyen, Wim
dc.contributor.authorMertens, Paul
dc.contributor.authorKraus, Harald
dc.contributor.authorKovacs, F.
dc.contributor.authorVermeyen, K.
dc.date.accessioned2021-10-15T16:19:58Z
dc.date.available2021-10-15T16:19:58Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9615
dc.sourceIIOimport
dc.titleRemoving metal gate process residues
dc.typeJournal article
dc.contributor.imecauthorMertens, Paul
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage61
dc.source.endpage62
dc.source.journalEuropean Semiconductor
dc.source.issue4
dc.source.volume26
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
10397.pdf
Size:
2.790Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record