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Advanced characterisation : an indispensable tool for ultra clean processing

dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBender, Hugo
dc.contributor.authorStorm, Wolfgang
dc.contributor.authorHeyns, Marc
dc.contributor.authorPolleunis, C.
dc.contributor.authorBertrand, P.
dc.date.accessioned2021-09-29T13:21:02Z
dc.date.available2021-09-29T13:21:02Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/961
dc.sourceIIOimport
dc.titleAdvanced characterisation : an indispensable tool for ultra clean processing
dc.typeJournal article
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage27
dc.source.endpage34
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume28
imec.availabilityPublished - open access
imec.internalnotesProceedings of the 9th Biennial Conference on Insulating Films on Semiconductors, June 7-10, 1995, Villard-de-Lans, France.


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