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Efficient pore sealing crucial for future interconnects

dc.contributor.authorVan Bavel, Mieke
dc.contributor.authorBeyer, Gerald
dc.contributor.authorIacopi, Francesca
dc.contributor.authorAbell, Thomas
dc.contributor.authorShamiryan, Denis
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T16:47:18Z
dc.date.available2021-10-15T16:47:18Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9704
dc.sourceIIOimport
dc.titleEfficient pore sealing crucial for future interconnects
dc.typeJournal article
dc.contributor.imecauthorVan Bavel, Mieke
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage111
dc.source.endpage114
dc.source.journalFuture Fab
dc.source.issue16
imec.availabilityPublished - imec


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