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Oxide-nitride-oxide layer optimisation for reliable embedded SONOS memories

dc.contributor.authorvan Schaijk, Rob
dc.contributor.authorVan Duuren, Michiel
dc.contributor.authorMei, Wan Yuet
dc.contributor.authorVan der Jeugd, Kees
dc.contributor.authorRothschild, Aude
dc.contributor.authorDemand, Marc
dc.date.accessioned2021-10-15T17:13:57Z
dc.date.available2021-10-15T17:13:57Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9790
dc.sourceIIOimport
dc.titleOxide-nitride-oxide layer optimisation for reliable embedded SONOS memories
dc.typeJournal article
dc.contributor.imecauthorVan der Jeugd, Kees
dc.contributor.imecauthorDemand, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage395
dc.source.endpage398
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume72
imec.availabilityPublished - open access
imec.internalnotesProceedings of the 13th Biennial Conference on Insulating Films on Semiconductors


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