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Analysis of the etching mechanisms of tungsten in fluorine containing plasmas

dc.contributor.authorVerdonck, Patrick
dc.contributor.authorSwart, J.
dc.contributor.authorBrasseur, Guy
dc.contributor.authorDe Geyter, Pascal
dc.date.accessioned2021-09-29T13:24:05Z
dc.date.available2021-09-29T13:24:05Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/990
dc.sourceIIOimport
dc.titleAnalysis of the etching mechanisms of tungsten in fluorine containing plasmas
dc.typeJournal article
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.source.peerreviewno
dc.source.beginpage1971
dc.source.endpage1976
dc.source.journalJ. Electrochem. Soc.
dc.source.volume142
imec.availabilityPublished - imec


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