dc.contributor.author | Wiaux, Vincent | |
dc.contributor.author | Bekaert, Joost | |
dc.contributor.author | Ronse, Kurt | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Fung Chen, J. | |
dc.contributor.author | Hsu, Stephen | |
dc.contributor.author | Van Den Broeke, Douglas | |
dc.contributor.author | Socha, Robert | |
dc.date.accessioned | 2021-10-15T17:55:14Z | |
dc.date.available | 2021-10-15T17:55:14Z | |
dc.date.issued | 2004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9918 | |
dc.source | IIOimport | |
dc.title | Through pitch low-k1 contact hole imaging with CPL(TM) technology | |
dc.type | Journal article | |
dc.contributor.imecauthor | Wiaux, Vincent | |
dc.contributor.imecauthor | Bekaert, Joost | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.orcidimec | Bekaert, Joost::0000-0003-3075-3479 | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.source.peerreview | no | |
dc.source.beginpage | 1 | |
dc.source.endpage | 11 | |
dc.source.journal | Photomask, BACUS News | |
dc.source.issue | 12 | |
dc.source.volume | 20 | |
imec.availability | Published - imec | |