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Hole trap generation in gate dielectric during substrate hole injection

dc.contributor.authorZhang, J.F.
dc.contributor.authorSii, H.K.
dc.contributor.authorChen, A.H.
dc.contributor.authorZhao, C.Z.
dc.contributor.authorUren, M.J.
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorDegraeve, Robin
dc.date.accessioned2021-10-15T18:12:31Z
dc.date.available2021-10-15T18:12:31Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9969
dc.sourceIIOimport
dc.titleHole trap generation in gate dielectric during substrate hole injection
dc.typeJournal article
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorDegraeve, Robin
dc.source.peerreviewno
dc.source.beginpageL1
dc.source.endpageL3
dc.source.journalSemiconductor Science and Technology
dc.source.issue1
dc.source.volume19
imec.availabilityPublished - imec


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