Browsing by Author "Agarwal, A."
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Publication Study of Endurance Performance of SiO2 Interfacial Layer Scaling Through O Scavenging in Si Channel n-FeFET With Si:HfO2 Ferroelectric Layer
Journal article2024, IEEE TRANSACTIONS ON ELECTRON DEVICES, (71) 8, p.4619-4625Publication Yttrium Doped Hf.05Zr0.5O2 Based Ferroelectric Capacitor Exhibiting Fatigue Free (>10sub12 Cycles), Long Retention, and Imprint Immune Performance at 4 K
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