Browsing by Author "Anwand, W."

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n+ doping of Ge by P or As implantation and flash-lamp annealing

Wündisch, C.
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Posselt, M.
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Anwand, W.
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Schmidt, B.
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Grötzschel, R.
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Mücklich, A.
;
Skorupa, W.
Meeting abstract
2008, E-MRS Spring Meeting Symposium I: Front-End Junction and Contact Formation in Future Silicon/Germanium Based Devices, 26/05/2008
RTA and FLA of Ultra-shallow implanted layers in Ge

Wündisch, C.
;
Posselt, M.
;
Anwand, W.
;
Schmidt, B.
;
Mücklich, A.
;
Skorupa, W.
;
Clarysse, Trudo
Proceedings paper
2008, 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP, 30/09/2008, p.245-249