Browsing by Author "Birkner, Robert"
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Publication AIMS TM 45 inspection of CH treated with inverse lithography
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication Impact of alternative mask stacks on the imaging performance at NA 1.20 and above
Proceedings paper2007, SPIE Photomask Technology (BACUS), 18/09/2007, p.67301NPublication Phame: phase measurements on 45nm node phase shift features
Proceedings paper2008, Photomask and Next-Generation Lithography Mask Technology XV, 16/04/2008, p.70282ZPublication Phase behavior through pitch and duty cycle and its impact on process window
Proceedings paper2009, Photomask and Next-Generation Lithography Mask Technology XVI, 8/04/2009, p.737916Publication Test of vector effect emulation of the AIMSTM45-193i
Oral presentation2007, 4th International Immersion Lithography SymposiumPublication Using the AIMS 45-193i for hyper-NA imaging applications
Proceedings paper2007, SPIE Photomask Technology (BACUS), 18/09/2007, p.67301G