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    Challenges and solutions ensuring EUVL photomask integrity

    Brux, O.
    ;
    Dress, P.
    ;
    Schmalfuss, H.
    ;
    Jonckheere, Rik  
    ;
    Koolen-Hermkens, W.
    Proceedings paper
    2012, Photomask and Next-Generation Lithography Mask Technology XIX, 17/04/2012, p.84411J

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