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Browsing by Author "Carpaij, R."

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    Characterization of integrated optical CD for process control

    Yu, J.
    ;
    Uchida, J.
    ;
    Van Dommelen, Y.
    ;
    Carpaij, R.
    ;
    Cheng, Shaunee
    ;
    Pollentier, Ivan  
    ;
    Viswanathan, A.
    Proceedings paper
    2004, Metrology, Inspection, and Process Control for Microlithography XVIII, 22/02/2004, p.1059-1068
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    Freeform illumination sources: Source mask optimization for 22 nm node SRAM

    Bekaert, Joost  
    ;
    Laenens, Bart
    ;
    Verhaegen, Staf
    ;
    Van Look, Lieve  
    ;
    Trivkovic, Darko  
    Proceedings paper
    2009, 6th International Symposium on Immersion Lithography Extensions, 22/10/2009
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    In-line litho cluster monitoring and control using integrated scatterometry

    Pollentier, Ivan  
    ;
    Cheng, Shaunee
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    Baudemprez, Bart  
    ;
    Laidler, David  
    ;
    van Dommelen, Y.
    ;
    Carpaij, R.
    Proceedings paper
    2004-02, Data Analysis and Modeling for Process Control, 22/02/2004, p.105-115

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