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    Focus sensitivity of CD extreme values demonstrated on a 40 nm pitch DRAM hexagonal contact hole use case printed with 0.33 NA EUV lithography

    Frommhold, Andreas  
    ;
    Slachter, Bram
    ;
    Chen, Jerem
    ;
    Rispens, Gijsbert
    Proceedings paper
    2026, Metrology, Inspection, and Process Control XL, 2026-02-22, p.1398131

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