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Browsing by Author "Christy, Dennis"

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    Publication

    Substantial Dose Reduction Using Dry Deposited Underlayer for EUV Lithography While Maintaining Roughness and Minimizing Defects

    Kundu, Achintya  
    ;
    Gupta, Mihir  
    ;
    De Simone, Danilo  
    ;
    Vanelderen, Pieter  
    ;
    Suh, Hyo Seon  
    Proceedings paper
    2024, 2024 International Conference on Extreme Ultraviolet Lithography, SEP 30-OCT 03, 2024, p.Art. 132150M

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