Browsing by Author "Curvacho, Gabriel"
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Publication High NA EUV single patterning of advanced metal logic nodes: Inverse lithography techniques in combination with alternative mask absorbers
Proceedings paper2024, 39th European Mask and Lithography Conference (EMLC), JUN 17-19, 2024, p.Art. 132731MPublication Low Landing Energy as an Enabler for Optimal Contour Based OPC Modeling in the EUV Era