Browsing by Author "De Schepper, P."

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28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography

Kim, Il Hwan
;
Kim, Insung
;
Park, Changmin
;
Lee, Jsiun
;
Ryu, Koungmin
;
De Schepper, P.
;
Doise, J.
Proceedings paper
2021, Conference on Extreme Ultraviolet (EUV) Lithography XII, FEB 22-26, 2021, p.116090Q
PECVD silicon nitride passivation and ARC layers for srceenprinted multicrystalline silicon solar cells

Duerinckx, Filip
;
Szlufcik, Jozef
;
De Clercq, Koen
;
De Schepper, P.
;
Laureys, Wim
;
Nijs, Johan
Proceedings paper
1995, 13th European Photovoltaic Solar Energy Conference and Exhibition. Proceedings of the International Conference, 23/10/1995, p.1493-1496