Browsing by Author "Dress, Peter"
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Publication Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance
Proceedings paper2011, 27th European Mask and Lithography Conference - EMLC, 18/01/2011, p.79850NPublication Integrated cleaning and handling automation of NXE3100 reticles
Proceedings paper2012, 28th European Mask and Lithography Conference, 17/01/2012, p.83520UPublication Minimizing particle contamination of NXE3100 reticles
Oral presentation2012, International Symposium on Extreme Ultraviolet Lithography - EUVL