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Browsing by Author "Elsmore, Chris"

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    Comparison of HCl gas-phase cleaning with conventional and dilute wet chemistries

    Elsmore, Chris
    ;
    Hurd, Trace
    ;
    Meuris, Marc  
    ;
    Mertens, Paul  
    ;
    Heyns, Marc  
    Proceedings paper
    1996, Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 9/10/1995, p.142-149
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    Development of an environmentally-friendly HCl gas-phase clean

    Elsmore, Chris
    ;
    Meuris, Marc  
    ;
    Mertens, Paul  
    ;
    Hurd, Trace
    ;
    Heyns, Marc  
    Proceedings paper
    1995, Proceedings IES 41st Annual Technical Meeting, 30/04/1995, p.487-494
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    Generation and transport of corrosion products in HCL gas lines

    Vereecke, Guy  
    ;
    Heyns, Marc  
    ;
    Anderson, Nigel
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    Elsmore, Chris
    ;
    Espitalier-Noel, P.
    Journal article
    1997, Future Fab International, (1) 2, p.283-288
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    Generation and transport of corrosion products in HCl gas lines

    Vereecke, Guy  
    ;
    Anderson, Nigel
    ;
    Elsmore, Chris
    ;
    Espitalier-Noel, P.
    ;
    Heyns, Marc  
    Proceedings paper
    1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.69-72
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    The effect of CF4 contaminant gas on N2O oxidation

    Kelleher, Ann
    ;
    Elsmore, Chris
    ;
    Schaekers, Marc  
    ;
    Mertens, Paul  
    ;
    Heyns, Marc  
    ;
    Mangelschots, G.
    Oral presentation
    1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
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    U.V. activated cleaning using NO, HCl and NO/HCl

    Elsmore, Chris
    ;
    Gluck, Ronald
    ;
    Carr, Philip
    ;
    Meuris, Marc  
    ;
    Mertens, Paul  
    ;
    Heyns, Marc  
    Proceedings paper
    1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.125-129

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