Browsing by Author "Fragala, I.L."

Now showing 1 - 4 of 4

Fluorine-free and fluroine containing MOCVD precursors for electronic oxides

Bedoya, C.
;
Condorelli, G.G.
;
Di Mauro, A.
;
Anastasi, G.
;
Fragala, I.L.
;
Lisoni, Judit
Journal article
2005, Materials Science and Engineering B, (118) 1_3, p.264-269
MOCVD of bismuth oxides: transport properties and deposition mechanisme of the Bi(C6H5)3 precursor

Bedoya, C.
;
Condorelli, G.G.
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Anastasi, G.
;
Baeri, A.
;
Scerra, F.
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Fragala, I.L.
;
Lisoni, Judit
Journal article
2004, Chemistry of Materials, (16) 16, p.3176-3183
MOCVD of SBT from fluorine containing precursor system: microstructure optimization and fluorine elimination

Condorelli, G.G.
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Anastasi, G.
;
Bedoya, C.
;
Favazza, M.
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Baeri, A.
;
Lo Nigro, R.
;
Menou, N.
Oral presentation
2004, European Material Research Society Spring Meeting Symposium D: Functional Oxides for Advanced Semiconductor Technologies
MOCVD of Sr-containing oxides: transport properties and deposition mechanisms of the Sr(tmhd)(2)center dot pmdeta precursor

Bedoya, C.
;
Condorelli, G.G.
;
Motta, A.
;
Mauro, A.
;
Anastasi, G.
;
Fragala, I.L.
;
Lisoni, Judit
Journal article
2005, Chemical Vapor Deposition, (11) 5, p.269-275