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Browsing by Author "Franklin, C."

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    Single wafer cleaning and drying: particle removal via a non-contact, non-damaging megasonic clean followed by a high performance "Rotagoni" dry

    Lauerhaas, Jeff
    ;
    Mertens, Paul  
    ;
    Fyen, Wim
    ;
    Kenis, Karine  
    ;
    Meuris, Marc  
    ;
    Nicolosi, T.
    ;
    Bran, M.
    Proceedings paper
    2000, Proceedings of the 9th International Symposium on Semiconductor Manufacturing - ISSM, 26/09/2000, p.157-160

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