Browsing by Author "Graves, Trey"
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Publication Comparative stochastic process variation bands for N7, N5, and N3 at EUV
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 12/02/2018, p.105830KPublication DSA graphoepitaxy calibrations for contact hole multiplication
Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.94250YPublication Impact of mask line roughness in EUV lithography
Proceedings paper2011, Extreme Ultraviolet (EUV) Lithography II, 27/02/2011, p.79691TPublication Mask absorber roughness impact in extreme ultraviolet lithography
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 2, p.23012Publication Statistical simulation of resist at EUV and ArF
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727319