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Browsing by Author "Gushchin, O."

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    Application of fully fluorinated cyclic saturated hydrocarbons for highly selective nanoscale silicon dioxide reactive ion etching

    Yanovich, S.
    ;
    Baklanov, Mikhaïl
    ;
    Orlov, S.
    ;
    Gushchin, O.
    ;
    Zaitsev, N.
    ;
    Ignatov, P.
    ;
    Yafarov, R.
    Meeting abstract
    2012, Plasma Etch and Strip in Microelectronics - PESM, 15/03/2012
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    Maskless fabrication of high density silicon nan-pin structures with carbon nano clusters acting as mask for subsequent microwave silicon etching

    Yanovich, S.
    ;
    Baklanov, Mikhaïl
    ;
    Gushchin, O.
    ;
    Gornev, E.
    ;
    Danila, A.
    Meeting abstract
    2012, Plasma Etch and Strip in Microelectronics - PESM, 15/03/2012

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