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    Status update on a new class of solution processable low-k dielectric coating for use as ILD with k <2.4

    Pakbaz, Hash
    ;
    Hacker, N
    ;
    Tokei, Zsolt  
    ;
    Baklanov, Mikhaïl
    Meeting abstract
    2015, AVS 62nd International Symposium & Exhibition, 18/10/2015, p.EM-ThM5

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