Browsing by Author "Hanekawa, Hiroshi"
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Publication Comparing bright field imaging performance at 0.33 NA of a novel low-reflectivity low-n and a standard Ta-based EUV mask
Proceedings paper2025, 40th European Mask and Lithography Conference - EMLC, 2025-06-16, p.137870APublication Experimental imaging comparison at 0.55 NA of a low-reflectivity low-n mask to a standard Ta-based EUV mask
; ; ; ; ; Proceedings paper2026, Optical and EUV Nanolithography XXXIX, 2026-02-22, p.139791I