imec Institutional Repository Browsing {{ collection }} by Author "Hansen, Steve"

Publication

Accurate models for EUV lithography

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Jiang, Jiong

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Chen, Luoqi

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Lui, Wei

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Van Setten, Eelca

Proceedings paper

2009, Photomask Technology 2009, 14/09/2009, p.74882G

Publication

Accurate models for EUV Lithography

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Van Setten, Eelco

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Hansen, Steve

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Jiang, Jiong

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Proceedings paper

2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009

Publication

The impact of mask birefringence on hyper-NA (NA>1.0) polarized imaging

Geh, Bernd

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Flagello, Donis

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Progler, Chris

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Martin, Patrick

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Leunissen, Peter

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Hansen, Steve

Proceedings paper

2005, 25th Annual BACUS Symposium on Photomask Technology, 3/10/2005, p.599210

Browsing by Author "Hansen, Steve"