Browsing by Author "Hoppe, Wolfgang"
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Publication Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 26/02/2018, p.105830OPublication Tuning, Modelling, and Verifying Effects of Intermixing on EUV Multilayer Mirror Performance via a Combined Simulation and Experimental Approach
Proceedings paper2025, Photomask Technology, 2025-09-22, p.136870Z