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Browsing by Author "Hoppe, Wolfgang"

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    Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison

    Gao, Weimin  
    ;
    Wiaux, Vincent  
    ;
    Hoppe, Wolfgang
    ;
    Philipsen, Vicky  
    ;
    Melvin, Lawrence
    Proceedings paper
    2018, Extreme Ultraviolet (EUV) Lithography IX, 26/02/2018, p.105830O

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