Repository logo Institutional repository
  • Communities & Collections
  • Browse
  • Site
Search repository
High contrast
  1. Home
  2. Browse by Author

Browsing by Author "Hoshiko, Kenji"

Filter results by typing the first few letters
Now showing 1 - 6 of 6
  • Results Per Page
  • Sort Options
  • Loading...
    Thumbnail Image
    Publication

    Comparison of LFLE and LELE manufacturability

    Miller, Andy  
    ;
    Maenhoudt, Mireille
    ;
    Vangoidsenhoven, Diziana  
    ;
    Murdoch, Gayle  
    ;
    Shioya, Takeo
    Proceedings paper
    2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008
  • Loading...
    Thumbnail Image
    Publication

    Double patterning process with resist freezing technique

    Hoshiko, Kenji
    ;
    Shioya, Takeo
    ;
    Fujiwara, Koichi
    ;
    Yamaguchi, Yoshikazu
    ;
    Shimokawa, Tsutomu
    Proceedings paper
    2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008
  • Loading...
    Thumbnail Image
    Publication

    Full-wafer in-situ fabrication and packaging of microfluidic flow cytometer with photo-patternable adhesive polymers

    de Wijs, Koen  
    ;
    Liu, Chengxun  
    ;
    Majeed, Bivragh  
    ;
    Jans, Karolien  
    ;
    O'Callaghan, John  
    ;
    Loo, Josine
    Journal article
    2018, Biomedical Microdevices, (20) 2, p.1-10
  • Loading...
    Thumbnail Image
    Publication

    Point-of-use filtration methods to reduce defectivity

    Braggin, Jennifer
    ;
    Schollaert, Wim  
    ;
    Hoshiko, Kenji
    ;
    Buch, X.
    Proceedings paper
    2010, Advances in Resist Materials & Processing Technology XXVII, 21/02/2010, p.763918
  • Loading...
    Thumbnail Image
    Publication

    Roughness and variability in EUV lithography: Who is to blame? (Part 1)

    Vaglio Pret, Alessandro  
    ;
    Gronheid, Roel  
    ;
    Younkin, Todd
    ;
    Winroth, Gustaf
    ;
    Biafore, John
    Proceedings paper
    2013, Extreme Ultraviolet (EUV) Lithography IV, 24/02/2013, p.86792O
  • Loading...
    Thumbnail Image
    Publication

    XAS photoresists electron/quantum yields study with synchrotron light

    De Schepper, Peter  
    ;
    Vaglio Pret, Alessandro  
    ;
    Hansen, Terje
    ;
    Giglia, Angelo
    ;
    Hoshiko, Kenji
    Proceedings paper
    2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.942507

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings