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Browsing by Author "Houser, David C."

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    Direct comparison of resist outgassing and optics contamination using in-band EUV photon exposure and e-beam exposure from several EUV sensitive resists

    Perera, Rupert c.
    ;
    Pollentier, Ivan  
    ;
    Underwood, James H.
    ;
    Houser, David C.
    Oral presentation
    2012, Extreme Ultraviolet (EUV) Lithography III

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